DocumentCode
3521162
Title
Wigner Monte Carlo approach to quantum and dissipative transport in Si-MOSFETs
Author
Koba, Shunsuke ; Tsuchiya, Hideaki ; Ogawa, Matsuto
Author_Institution
Dept. of Electr. & Electron. Eng., Kobe Univ., Kobe, Japan
fYear
2011
fDate
8-10 Sept. 2011
Firstpage
79
Lastpage
82
Abstract
We investigate the influences of quantum transport and scattering effects in Si double-gate MOSFETs based on Wigner Monte Carlo (WMC) approach. It is shown that quantum reflection effect makes significant differences in microscopic features of electron transport between classical and quantum approaches and can even reduce drain current at on-state, but it does not necessarily produce drastic change in macroscopic properties including the drain current. On the other hand, source-drain direct tunneling crucially degrades the subthreshold properties in scaled MOSFETs with sub-10 nm gate length. Furthermore, the ability of the WMC method to describe quantum-classical transition of carrier transport is demonstrated.
Keywords
MOSFET; Monte Carlo methods; elemental semiconductors; quantum theory; semiconductor device models; silicon; Si; Si-MOSFET; WMC method; Wigner Monte Carlo Approach; dissipative transport; double-gate MOSFET; drain current; electron transport; macroscopic properties; quantum reflection effect; quantum transport; quantum-classical transition; scattering effect; source-drain direct tunneling; subthreshold properties; Distribution functions; Logic gates; MOSFETs; Monte Carlo methods; Reflection; Scattering; Tunneling; Quantum reflection; Wigner Monte-Carlo approach; quantum-classical transition; tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
Conference_Location
Osaka
ISSN
1946-1569
Print_ISBN
978-1-61284-419-0
Type
conf
DOI
10.1109/SISPAD.2011.6035054
Filename
6035054
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