Title :
Effect of boron addition on the ordering process in the FePt thin film
Author :
Lee, Chan-Gyu ; Lee, Byeong-Seon ; Shimada, Y. ; Kitakami, O. ; Okamoto, S. ; Miyazaki, T.
Author_Institution :
Sch. of Nano Adv. Mater. Eng., Changwon Nat. Univ., South Korea
Abstract :
The (MgO)20 nm/(FePt-B)10 nm/(MgO)20 nm films were prepared on Si(111) substrates in a RF magnetron sputtering system under an argon gas pressure of 5 mTorr. The boron chips were uniformly placed on the FePt target. Annealing was performed in the vacuum chamber of 2×10-7 Torr at the temperature of 25∼600°C for 1 hr. The magnetic properties of the film were examined by a digital measurement system vibrating sample magnetometer (DMSVSM) in the maximum field of 26 kOe. The crystal structure and the lattice parameters were determined by the X-ray diffractometry with symmetric θ-2θ scan. The lattice parameters, a and c, were accurately evaluated by Cohen´s method using the Nelson-Reily function.
Keywords :
X-ray diffraction; annealing; boron; crystal structure; iron alloys; lattice constants; magnesium compounds; magnetic multilayers; magnetic thin films; metallic thin films; platinum alloys; sputter deposition; 1 h; 10 nm; 20 nm; 25 to 600 degC; 2E-7 torr; 5 mtorr; Cohen method; MgO-FePt-B; Nelson-Reily function; RF magnetron sputtering; Si; X-ray diffractometry; annealing; crystal structure; digital measurement system vibrating sample magnetometer; lattice parameters; vacuum chamber; Annealing; Argon; Boron; Lattices; Magnetic properties; Radio frequency; Sputtering; Substrates; Temperature; Transistors;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1463861
