Title :
Reflow of non-circular nano-pillars to fabricate nano-scale solid immersion lenses
Author :
Myun-Sik Kim ; Keeler, Ethan ; Rydberg, Skyler ; Nakagawa, Wataru ; Osowecki, G. ; Scharf, T. ; Herzig, H.P.
Author_Institution :
Opt. & Photonics Technol. Lab., Ecole Polytech. Fed. de Lausanne (EPFL), Neuchâtel, Switzerland
Abstract :
We investigate the reflow of non-circular, i.e., triangular and square, shaped pillars to fabricate nano-scale solid immersion lenses (SILs). Electron beam lithography (EBL) and thermal reflow are the core of the fabrication process. For the optical characterization at λ = 642 nm, nano-SILs are replicated on a transparent substrate by soft lithography. The focal spots produced by the nano-SILs show both spot-size reduction and peak-intensity enhancement, which are consistent with the immersion effect.
Keywords :
electron beam lithography; immersion lithography; microlenses; nanofabrication; nanostructured materials; replica techniques; soft lithography; electron beam lithography; focal spots; nanoscale solid immersion lenses; noncircular nanopillars; optical characterization; peak-intensity enhancement; replication; shaped pillars; soft lithography; spot-size reduction; square pillars; thermal reflow; transparent substrate; triangular pillars; wavelength 642 nm; Lenses; Optical device fabrication; Optical imaging; Shape; Solids; Substrates;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
Conference_Location :
Banff, AB
Print_ISBN :
978-1-4577-1511-2
DOI :
10.1109/OMEMS.2012.6318831
