DocumentCode
3534294
Title
Effect of deposition in the presence of magnetic field on the magnetic properties of CVD cobalt
Author
Deo, N. ; Bain, M.F. ; Montgomery, John H. ; Kelly, B. ; Gamble, H.S.
Author_Institution
Sch. of Electr. & Electron. Eng., Queen´´s Univ., Belfast, UK
fYear
2005
fDate
4-8 April 2005
Firstpage
937
Lastpage
938
Abstract
Cobalt layers are deposited in the presence of magnetic field by chemical vapor deposition (CVD). Magnetic properties of layers fabricated with and without the presence of a magnetic field are studied and compared.
Keywords
chemical vapour deposition; cobalt; coercive force; grain size; magnetic domains; metallic thin films; CVD cobalt; Co; chemical vapor deposition; coercivity; hysteresis loop structure; magnetic domain size; magnetic field effects; magnetic properties; magnetisation; Aluminum; Cobalt; Magnetic domains; Magnetic field measurement; Magnetic fields; Magnetic flux; Magnetic force microscopy; Magnetic properties; Magnets; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1463897
Filename
1463897
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