Epitaxial thin films of half-metallic CrO2 deposited on oxidized Si substrates by PLD using Cr2O3 target

Author

Dwivedi, Sudhanshu ; Biswas, Somnath

Author_Institution

LNM Inst. of Inf. Technol., Jaipur, India

fYear

2011

fDate

28-30 Nov. 2011

Firstpage

219

Lastpage

222

Abstract

Epitaxial thin films of half-metallic compound CrO₂ with (110) crystal orientation have been deposited on oxidized Si (100) substrates by pulsed laser deposition (PLD) technique using KrF excimer laser and Cr₂O₃ target. The deposited films were characterized with XRD, SEM, FTIR, surface profilometry, AFM and spectroscopic ellipsometry.

Keywords

Fourier transform spectra; X-ray diffraction; atomic force microscopy; chromium compounds; crystal orientation; ellipsometry; epitaxial layers; excimer lasers; infrared spectra; laser materials processing; pulsed laser deposition; scanning electron microscopy; (110) crystal orientation; AFM; CrO₂; FTIR; KrF excimer laser; PLD; SEM; XRD; deposited film; epitaxial thin film; half-metallic compound; oxidized Si (100) substrate; pulsed laser deposition technique; spectroscopic ellipsometry; surface profilometry; Ellipsometry; Epitaxial growth; Lattices; Polymers; Half-metals; chromium di-oxide (CrO2); epitaxial thin films; pulsed laser deposition;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanoscience, Engineering and Technology (ICONSET), 2011 International Conference on

Conference_Location

Chennai

Print_ISBN

978-1-4673-0071-1

Type

conf

DOI

10.1109/ICONSET.2011.6167958

Filename

6167958