DocumentCode
3534765
Title
Off-centering reduction of coplanar micro liquid lens using a thickness-gradient dielectric
Author
Yangkyu Park ; Seungwan Seo ; Jong-Hyun Lee
Author_Institution
Dept. of Nanobio Mat. & Electron., Gwangju Inst. of Sci. & Technol. (GIST), Gwangju, South Korea
fYear
2012
fDate
6-9 Aug. 2012
Firstpage
208
Lastpage
209
Abstract
We have fabricated coplanar liquid lens having dielectric layer with thickness gradient, which was realized using reflow process of photoresist, demonstrating that the off-centering error was 20um that is considerably smaller than geometrical centering.
Keywords
dielectric materials; microlenses; photoresists; coplanar microliquid lens; dielectric layer; off-centering error; off-centering reduction; photoresist; reflow process; thickness-gradient dielectric; Adaptive optics; Biomedical optical imaging; Dielectrics; Lenses; Liquids; Optical device fabrication; Resists; dielectric; electrowetting; liquid lens; reflow; self-centering; thickness gradient;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
Conference_Location
Banff, AB
ISSN
2160-5033
Print_ISBN
978-1-4577-1511-2
Type
conf
DOI
10.1109/OMEMS.2012.6318876
Filename
6318876
Link To Document