DocumentCode :
3535099
Title :
Silicon quantum-dot transistors operating above 100 K
Author :
Leobandung, E. ; Lingjie Guo ; Yun Wang ; Chou, S.Y.
Author_Institution :
Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
fYear :
1995
fDate :
19-21 June 1995
Firstpage :
48
Lastpage :
49
Abstract :
Reports the fabrication and characterization of unique silicon quantum-dot transistors (QDTs) that demonstrate quantum as well as single-electron Coulomb blockade effects at temperatures above 100 K. They are also the first Si transistors that show interference between different modes of quantum waves in a cavity. The transistors were fabricated on SIMOX (separation by implanted oxygen) silicon wafer with the top silicon layer 70 nm thick.
Keywords :
SIMOX; elemental semiconductors; quantum interference devices; semiconductor quantum dots; semiconductor technology; silicon; 70 nm; SIMOX; Si; quantum wave modes; quantum-dot transistors; semiconductor device characterization; semiconductor device fabrication; single-electron Coulomb blockade effects; Etching; Interference; Oxidation; Quantum dots; Shape; Silicon; Single electron transistors; Temperature; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 1995. Digest. 1995 53rd Annual
Conference_Location :
Charlottesville, VA, USA
Print_ISBN :
0-7803-2788-8
Type :
conf
DOI :
10.1109/DRC.1995.496265
Filename :
496265
Link To Document :
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