DocumentCode :
3540288
Title :
Perpendicular exchange bias in nickel/antiferromagnetic bilayers
Author :
van Dijken, Sebastiaan ; Crofton, Matthew ; Coey, J.M.D.
Author_Institution :
Phys. Dept., Trinity Coll., Dublin, Ireland
fYear :
2005
fDate :
4-8 April 2005
Firstpage :
2047
Lastpage :
2048
Abstract :
Exchanged biased Ni films with perpendicular magnetic anisotropy is studied using bilayers of 4 nm thick Ni and a thin antiferromagnetic (AF) film. The AF materials used were FeMn, IrMn, NiMn, and PtMn. Results show that the exchange bias field is largest for FeMn, considerably smaller for IrMn and NiMn and zero for PtMn. The difference in exchange bias field between FeMn and IrMn is explained in terms of film texture, grain size, and interface roughness. The very low (NiMn) and zero (PtMn) perpendicular exchange bias measured on the Ni/AFM bilayer is due to the fcc film structure. An attempt to anneal the Si(001)/50 nm Cu/4 nm Ni/AFM/5 nm Cu films at 200 °C resulted in severe mixing between the Cu and Ni layers which destroyed the perpendicular magnetic anisotropy.
Keywords :
antiferromagnetic materials; exchange interactions (electron); grain size; interface magnetism; interface roughness; iridium alloys; iron alloys; magnetic thin films; manganese alloys; nickel; nickel alloys; perpendicular magnetic anisotropy; platinum alloys; texture; 200 degC; Si-Cu-Ni-FeMn-Cu; Si-Cu-Ni-IrMn-Cu; Si-Cu-Ni-NiMn-Cu; Si-Cu-Ni-PtMn-Cu; annealing; fcc film structure; film texture; grain size; interface roughness; nickel-antiferromagnetic bilayers; perpendicular exchange bias; perpendicular magnetic anisotropy; thin antiferromagnetic film; Annealing; Antiferromagnetic materials; Laboratories; Magnetic anisotropy; Magnetic films; Magnetic hysteresis; Magnetization; Nickel; Perpendicular magnetic anisotropy; Physics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
Type :
conf
DOI :
10.1109/INTMAG.2005.1464462
Filename :
1464462
Link To Document :
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