DocumentCode :
3541188
Title :
Observation of negative differential conductance in nanoscale p-n junctions
Author :
Purwiyanti, Sri ; Moraru, Daniel ; Mizuno, Takayuki ; Tabe, Michiharu ; Hartanto, Djoko
Author_Institution :
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
fYear :
2013
fDate :
25-28 June 2013
Firstpage :
1
Lastpage :
4
Abstract :
Recently p-n junction characteristics in nanometer scale have been investigated in relation with photonics and electronics applications. In this paper, we report the experimental observation of negative differential conductance (NDC), the basic indication of tunneling, in nanoscale p-n junctions under forward bias condition. The NDC has been observed only at low temperatures, suggesting that tunneling is mediated by some states in the band gap, most likely by individual dopants with deeper energy levels compared to bulk. Furthermore, we also observed random telegraph signal (RTS) at low temperatures, which is ascribed to sudden changes of charge states of an individual dopant. These results illustrate the nature of individual dopants in nanoscalep-n junctions and their impact on device characteristics.
Keywords :
energy gap; p-n junctions; silicon-on-insulator; tunnelling; band gap; electronics applications; energy level; nanoscale p-n junctions; negative differential conductance; photonics applications; random telegraph signal; tunneling; Current measurement; Nanoscale devices; Nanowires; P-n junctions; Temperature; Temperature measurement; Tunneling; NDC; individual dopant; nanoscale p-n junction; tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
QiR (Quality in Research), 2013 International Conference on
Conference_Location :
Yogyakarta
Print_ISBN :
978-1-4673-5784-5
Type :
conf
DOI :
10.1109/QiR.2013.6632532
Filename :
6632532
Link To Document :
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