Title :
Resonant-body silicon nanowire field effect transistor without junctions
Author :
Bartsch, Sebastian T. ; Dupre, C. ; Ollier, E. ; Ionescu, A.M.
Author_Institution :
Nanoelectronic Devices Lab., Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland
Abstract :
We demonstrate the first implementation of a highly doped, silicon nanowire electromechanical resonator that exploits the depletion charge modulation in a junctionless FET to transduce mechanical motion on-chip. The resonator, with a typical length between 1 and 2 μm, a total height of 45 nm and a total width of 65 nm, is coupled via two lateral 60 nm air-gap gate electrodes. A fundamental resonance frequency of up to 226 MHz is detected in the drain current. This device is integrated in an FD-SOI-CMOS platform using conventional 8" inch wafer technology, which offers unique opportunities for compact sensing platforms interfaced with CMOS on a single chip.
Keywords :
CMOS integrated circuits; UHF field effect transistors; elemental semiconductors; nanowires; radiofrequency integrated circuits; resonators; silicon; silicon-on-insulator; FD-SOI-CMOS platform; air-gap gate electrodes; compact sensing platforms; depletion charge modulation; highly doped silicon nanowire electromechanical resonator; junctionless FET; resonant-body silicon nanowire field effect transistor; size 1 mum to 2 mum; size 65 nm; size 8 inch; transduce mechanical motion on-chip; wafer technology; Field effect transistors; Frequency modulation; Logic gates; Nanoelectromechanical systems; Resonant frequency; Silicon;
Conference_Titel :
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4673-4872-0
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2012.6479046