• DocumentCode
    3545008
  • Title

    Magnetron with virtual cathode

  • Author

    Fuks, Mikhail ; Schamiloglu, Edl

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of New Mexico, Albuquerque, NM, USA
  • fYear
    2013
  • fDate
    16-21 June 2013
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    The lifetime limitation of high power magnetrons is failure of their cathodes due to intense electron bombardment [1]. In the present work we study the operation of a compact relativistic magnetron [2] with a virtual cathode (VC) in the interaction space of the device instead of a physical cathode. A VC whose potential is equal to that of a real cathode appears in an electron beam when it is injected into a vacuum channel with a current that exceeds the space-charge-limiting current Ilim [3]. As follows from the stationary theory [4], a VC appears at a distance about channel radius from the injection plane and the axial position of the VC is closer to the plane as the injected current increases above Ilim. Evidently, for stable magnetron operation the injected current must exceed Ilim at least by the anode current. Nevertheless, the stationary theory cannot answer many uncertainties that are necessary for using such a VC in a magnetron as, for example, the time for VC formation; change in VC position when electrons deposit onto the anode; the VC position when the plane of injection is absent, but a source of electrons is outside the magnetron; and others. We study these problems using the particle-in-cell (PIC) code MAGIC.
  • Keywords
    anodes; cathodes; electric current; magnetrons; space charge; PIC code MAGIC; VC position; anode current; axial position; electron beam; electron bombardment; high power magnetrons; injected current; injection plane; lifetime limitation; particle-in-cell code MAGIC; space-charge-limiting current; stationary theory; vacuum channel; virtual cathode; Anodes; Cathodes; Computers; Electron beams; Microwave technology; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2013.6633277
  • Filename
    6633277