1-pm spectrally narrowed compact ArF excimer laser for microlithography

Summary form only given. We demonstrated 1-pm spectral narrowing with the compact ArF excimer laser. We achieved a high narrowing efficiency of 9% due to the design of the short resonator length with a short round-trip time, and the high excitation power density with high gain. This spectrally narrowed ArF excimer laser will be used in basic microlithography experiments with small exposure fields. The MOPA configuration using this laser as a master oscillator is useful for applications that require higher average power.