DocumentCode :
3551509
Title :
Recent advances in power junction transistors
Author :
Slade, B.N.
Volume :
1
fYear :
1955
fDate :
1955
Firstpage :
13
Lastpage :
13
Abstract :
This paper will discuss experimental P-N-P and N-P-N power transistors having low collector leakage, high breakdown voltage and high current gain. P-N-P transistors have been made with d.c. current amplification factors as high as 140 at 1 ampere, collector leakage current on the order of 20 microamperes and collector breakdown as high as 200 volts. These characteristics are attributed in part to the use of special junction alloys consisting of indium and gallium or aluminum. N-P-N transistors having leakage and voltage breakdown characteristics similar to the P-N-P transistors have been made with d.c. current amplification factors as high as 200 at 1 ampere. An alloy of arsenic in lead is used for both the emitter and collector junctions. Other considerations in the design of power transistors such as base lead resistance, emitter to collector punch through, and thermal drop will be discussed. Typical characteristics of transistors designed for Class B amplifier use as well as high voltage switching applications will be presented.
Keywords :
Aluminum alloys; Breakdown voltage; Dielectric breakdown; Gallium alloys; Gallium compounds; Indium; Lead; Leakage current; Power transistors; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1955 International
Type :
conf
DOI :
10.1109/IEDM.1955.186920
Filename :
1471967
Link To Document :
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