• DocumentCode
    3552330
  • Title

    Refractory sub-micron electron devices

  • Author

    Heynick, L.N.

  • Author_Institution
    Stanford Research Institute, Menlo Park, Calif.
  • Volume
    11
  • fYear
    1965
  • fDate
    1965
  • Firstpage
    32
  • Lastpage
    32
  • Abstract
    Several kinds of electron devices of sub-micron dimensions, the sole constituents of which are refractory metals and dielectrics, are under development at SRI, with a view toward high reliability and stability in systems containing large numbers of such components. Current work on micron-size tubes with field emission cathodes and on binary storage elements in this size range, accessible with high-resolution electron beams, is described. Also, the film deposition and micromachining techniques for producing such devices are discussed.
  • Keywords
    Aerospace electronics; Cathodes; Electron beams; Electron devices; Electron guns; Electron tubes; Hydrogen; Pulse modulation; Testing; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1965 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1965.187558
  • Filename
    1474139