• DocumentCode
    3552677
  • Title

    Development and characterization of varactor diodes for millimeter wavelenghts

  • Author

    Orman, C. ; Goff, M.

  • Author_Institution
    Sylvania Electric Products Inc., Woburn, Mass.
  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    84
  • Lastpage
    84
  • Abstract
    The GaAs varactors described here are P+NN+ mesa devices with base widths (distance between P-+ and N+regions) made as narrow as possible to achieve high cutoff frequency. Routine dimensions are now 1 to 2 microns using as thin a P+ diffusion as the epitaxial layer thickness permits. Diffusion depth is typically 1.5 to 2.0 microns. Metallization processing has contacted P-+ regions thinner than one micron deep without shorting. Epitaxial layer doping level (ND) is controlled to achieve high (25-45v) or low (10-25v) voltage breakdown devices.
  • Keywords
    Cutoff frequency; Dielectric breakdown; Diodes; Doping; Epitaxial layers; Gallium arsenide; Metallization; Neodymium; Varactors; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1967.187843
  • Filename
    1474924