DocumentCode
3552677
Title
Development and characterization of varactor diodes for millimeter wavelenghts
Author
Orman, C. ; Goff, M.
Author_Institution
Sylvania Electric Products Inc., Woburn, Mass.
Volume
13
fYear
1967
fDate
1967
Firstpage
84
Lastpage
84
Abstract
The GaAs varactors described here are P+NN+ mesa devices with base widths (distance between P-+ and N+regions) made as narrow as possible to achieve high cutoff frequency. Routine dimensions are now 1 to 2 microns using as thin a P+ diffusion as the epitaxial layer thickness permits. Diffusion depth is typically 1.5 to 2.0 microns. Metallization processing has contacted P-+ regions thinner than one micron deep without shorting. Epitaxial layer doping level (ND) is controlled to achieve high (25-45v) or low (10-25v) voltage breakdown devices.
Keywords
Cutoff frequency; Dielectric breakdown; Diodes; Doping; Epitaxial layers; Gallium arsenide; Metallization; Neodymium; Varactors; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1967 International
Type
conf
DOI
10.1109/IEDM.1967.187843
Filename
1474924
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