• DocumentCode
    3552695
  • Title

    Current gain (hFE) and cutoff frequency (fT) falloff at high current densities

  • Author

    Whittier, R.J. ; Tremere, D.A.

  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    100
  • Lastpage
    102
  • Abstract
    A theoretical and experimental study of bipolar transistor performance at high current densities has been performed. The analytical treatment is based upon the existence of a high level injection condition in the collector. Two models which describe the high current behavior of the collector junction space-charge region are discussed. The first deals with the formation of a current-induced base region at high current densities; the width of this current-induced base depends on the current density. The second model assumes that two-dimensional effects are predominant; at sufficiently high current densities lateral injection of carriers takes place. Theoretical curves for the current density necessary to bring about the space-charge limitation have been computed.
  • Keywords
    Bipolar transistors; Current density; Cutoff frequency; Electron devices; Etching; Germanium; Iron; Performance gain; Radiative recombination; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1967.187859
  • Filename
    1474940