DocumentCode
3553285
Title
Normally off silicon Schottky barrier FET and its application to integrated circuits
Author
Kawamura, Noritaka ; Shinoda, D. ; Igarashi, R. ; Muta, Hidemasa ; Seki, Yoshiaki
Volume
16
fYear
1970
fDate
1970
Firstpage
142
Lastpage
142
Abstract
A "normally off" silicon Schottky-barrier FET (SBFET) has been realized. The normal off characteristic was obtained by controlling the thickness of the reacted PtSi layer under the gate so that the depletion layer of the PtSi-Si Schottky-barrier contact might extend over the n-channel layer (n = 1.0 × 1016/cm3, t = 0.30 µm) and just reach the high resistivity (~ 3 kilohm-cm) p-type substrate. The threshold voltage was controlled in the range, 0 < Vth < 0.1 volt.
Keywords
Application specific integrated circuits; FET integrated circuits; Insulation; Logic arrays; Metal-insulator structures; Nonhomogeneous media; Schottky barriers; Silicon; Testing; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1970 International
Type
conf
DOI
10.1109/IEDM.1970.188329
Filename
1476441
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