DocumentCode
3553467
Title
Ion implanted, compatible, complementary PNP´s for high slew rate operational amplifiers
Author
Davis, P.C. ; Moyer, S.F.
Author_Institution
Bell Laboratories, Reading, Pennsylvania
Volume
18
fYear
1972
fDate
1972
Firstpage
18
Lastpage
20
Abstract
A compatible complementary pnp transistor with usable breakdown voltage has been developed which allows a significant improvement in the slew rate of monolithic integrated circuit amplifiers with low to moderate standby power. Monolithic circuits with high speed npn´s and lateral pnp´s can be made with high slew rates, but only at the expense of standby power. As this power becomes too large to remove from the chip, the performance is limited. Compatible, complementary pnp´s allow the node capacitances to be charged with high currents with low standby power, thus allowing a significant increase in circuit performance. The triple diffused vertical pnp´s reported earlier are not acceptable in amplifiers because of the low collector-emitter breakdown of approximately 7.5 volts. A similar acceptable two epi process has been reported using diffusion, however, the process described herein provides much tighter control on device parameters.
Keywords
Boron; Conductivity; Epitaxial layers; High power amplifiers; Ion implantation; MOSFET circuits; Monolithic integrated circuits; Operational amplifiers; Oxidation; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1972 International
Type
conf
DOI
10.1109/IEDM.1972.249233
Filename
1477076
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