• DocumentCode
    3553533
  • Title

    Ion implanted double-drift impatt diodes: Low-frequency noise

  • Author

    Lee, D.H.

  • Volume
    18
  • fYear
    1972
  • fDate
    1972
  • Firstpage
    86
  • Lastpage
    88
  • Abstract
    The low-frequency open circuit noise spectral density, S(f) = <V2>/Δf, of an avalanching junction can be represented by S(f) = a2VB2/Iowhere VB, Io, and a2are the reverse voltage, current, and a factor dependent on the ionization coefficients, respectively. For single-drift p+-n or n+-p silicon diodes a^{2} \\simeq 3.3 \\times 10^{-20} A/Hz. However, for symmetric p-n junctions, e.g., a double-drift IMPATT diode, the first-order theory predicts a^{2} \\simeq 4.4 \\times 10^{-20} A/Hz. Low-frequency noise measurements were made on a double-drift IMPATT to confirm the inverse current dependence and to experimentally determine the magnitude of a2.
  • Keywords
    Admittance; Companies; Current density; Doppler radar; Local oscillators; Low-frequency noise; Noise measurement; Semiconductor device noise; Semiconductor diodes; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1972 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1972.249313
  • Filename
    1477136