DocumentCode
3553533
Title
Ion implanted double-drift impatt diodes: Low-frequency noise
Author
Lee, D.H.
Volume
18
fYear
1972
fDate
1972
Firstpage
86
Lastpage
88
Abstract
The low-frequency open circuit noise spectral density, S(f) = <V2>/Δf, of an avalanching junction can be represented by S(f) = a2VB 2/Io where VB , Io , and a2are the reverse voltage, current, and a factor dependent on the ionization coefficients, respectively. For single-drift p+-n or n+-p silicon diodes
A/Hz. However, for symmetric p-n junctions, e.g., a double-drift IMPATT diode, the first-order theory predicts
A/Hz. Low-frequency noise measurements were made on a double-drift IMPATT to confirm the inverse current dependence and to experimentally determine the magnitude of a2.
A/Hz. However, for symmetric p-n junctions, e.g., a double-drift IMPATT diode, the first-order theory predicts
A/Hz. Low-frequency noise measurements were made on a double-drift IMPATT to confirm the inverse current dependence and to experimentally determine the magnitude of a2.Keywords
Admittance; Companies; Current density; Doppler radar; Local oscillators; Low-frequency noise; Noise measurement; Semiconductor device noise; Semiconductor diodes; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1972 International
Type
conf
DOI
10.1109/IEDM.1972.249313
Filename
1477136
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