DocumentCode
3553798
Title
Theory of the M. O. S. transistor in weak inversion - new method to determine the number of surface states
Author
Van Overstraeten, R. ; Declerck, G. ; Muls, P. ; Broux, G.
Author_Institution
Katholieke Universiteit Lueven, Heverlee, Belgium
Volume
19
fYear
1973
fDate
1973
Firstpage
346
Lastpage
349
Abstract
The drain current ID versus gate voltage VG of a MOST operating in weak inversion, and the influence of surface potential fluctuations on this characteristic have been studied before [1] The purpose of this paper is to derive an expression of the drain current ID versus the drain voltage VD for long channel devices. It is demonstrated that the surface potential fluctuations don´t affect the slope of the ID -VD curve whereas the density NSS of surface states strongly influences the slope for small drain voltages. This yields a simple and useful technique to determine NSS on M.O.S. transistors.
Keywords
Capacitance; Cascading style sheets; Dielectric substrates; Electron mobility; Fluctuations; Laboratories; MOSFETs; Poisson equations; Statistics; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1973 International
Type
conf
DOI
10.1109/IEDM.1973.188726
Filename
1477603
Link To Document