• DocumentCode
    3553986
  • Title

    Reliability studies of one-micron Schottky gate GaAs FET

  • Author

    Kozu, Hideaki ; Nagasako, Isamu ; Ogawa, Masaki ; Kawamura, Nobuo

  • Author_Institution
    Nippon Electric Co., Ltd., Kawasaki, JAPAN
  • Volume
    21
  • fYear
    1975
  • fDate
    1975
  • Firstpage
    247
  • Lastpage
    250
  • Abstract
    Failure modes have been studied experimentally on a low-noise one-micron aluminum gate GaAs FET. Several life tests, including high temperature storage, power burn-in, and gate biasing at elevated temperature, were carried out on more than 200 samples. It has been revealed that gradual degradation of source and drain contact resistance is the major life-determining failure mode. MTTF was estimated to be about 109hours for channel temperature of 80°C. Surge tests were also carried out. In some specimens, reversible drift of electrical parameters was observed. This instability seems to be related with deep level trapping centers in the GaAs epitaxial layer substrate interface.
  • Keywords
    Aluminum; Contact resistance; Degradation; Epitaxial layers; FETs; Gallium arsenide; Life testing; Substrates; Surges; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1975 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1975.188871
  • Filename
    1478232