DocumentCode
3554056
Title
The infrared sensing MOSFET
Author
Wittmer, L.L. ; Parker, W.C. ; Elabd, H. ; Loh, K.W. ; Yeargan, J.R. ; Forbes, L.
Author_Institution
University of Arkansas, Fayetteville, Arkansas
Volume
21
fYear
1975
fDate
1975
Firstpage
510
Lastpage
513
Abstract
Experimental results are presented on the operation of gold-, indium-, and gallium-doped silicon MOSFET´s as infrared photon detectors (IRFET´s) [1]. Photoionization of these impurity centers in the surface space charge depletion region of the MOSFET causes a modulation in the threshold voltage and the conductivity of the MOSFET. Previous results on gold-doped devices [2,3] have been extended to indium-doped devices [4] and preliminary results obtained on gallium-doped devices. The IRFET exhibits large gains and responsivities of 1.0 milliamp/microwatt (10 milliwatts/microjoule) are easily achieved with indium-doped devices. It is shown that shot noise or background limited rather than 1/f noise limited operation can be achieved. By the use of these three dopants, the near, middle, and far infrared wavelength regions can be covered.
Keywords
Background noise; Conductivity; Gallium compounds; Impurities; Infrared detectors; Ionization; MOSFET circuits; Silicon; Space charge; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1975 International
Type
conf
DOI
10.1109/IEDM.1975.188935
Filename
1478296
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