Surface reaction and desorption probed by femtosecond second harmonic generation: Cl etching of Si(111) surface

Author

Sasaki, F. ; Haraichi, S. ; Kobayashi, S. ; Tani, Tomoyuki ; Komuro, M.

Author_Institution

Electrotech. Lab., Tsukuba, Japan

fYear

1996

fDate

7-7 June 1996

Firstpage

59

Lastpage

60

Abstract

Summary form only given. To study surface science because of its surface sensitivity, nondetrimental and in situ observation, and the ultrafast response we use femtosecond time-resolved studies of the desorption and/or reaction on the semiconductor surfaces have been carried out. We report the results of the laser-induced surface reaction and/or desorption on the Si(111)/Cl/sub 2/ system by use of the femtosecond second harmonic generation.

Keywords

chemical reactions; desorption; etching; high-speed optical techniques; laser beam effects; optical harmonic generation; silicon; surface phenomena; Cl; Cl etching; Cl/sub 2/; Si; Si(111) surface; Si(111)/Cl/sub 2/ system; desorption; femtosecond second harmonic generation; femtosecond time-resolved studies; in situ observation; laser-induced surface reaction; semiconductor surface reaction; surface desorption; surface reaction; surface science; surface sensitivity; ultrafast response; Etching; Frequency conversion; Nonlinear optics; Optical harmonic generation; Optical pumping; Optical sensors; Optical surface waves; Probes; Ultrafast electronics; Ultrafast optics;

fLanguage

English

Publisher

ieee

Conference_Titel

Quantum Electronics and Laser Science Conference, 1996. QELS '96., Summaries of Papers Presented at the

Conference_Location

Anaheim, CA, USA

Print_ISBN

1-55752-444-0

Type

conf

Filename

865570