DocumentCode

3554231

Title

Electron optics of the electron-beam lithography system, EL1

Author

Mauer, J.L. ; Pfeiffer, H.C. ; Stickel, W.

Author_Institution

IBM System Products Division, East Fishkill, Hopewell Junction, New York

Volume

22

fYear

1976

fDate

1976

Firstpage

434

Lastpage

436

Keywords

Apertures; Coils; Electron beams; Electron optics; Focusing; Laboratories; Lenses; Lithography; Magnetic shielding; Probes;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1976 International

Type

conf

DOI

10.1109/IEDM.1976.189076

Filename

1478788