DocumentCode
3554239
Title
Thin film AlAs/GaAs on graphite solar cells
Author
Johnston, W.D., Jr. ; Callahan, W.M.
Author_Institution
Bell Telephone Laboratories, Inc., Holmdel, New Jersey
Volume
22
fYear
1976
fDate
1976
Firstpage
461
Lastpage
464
Abstract
We have prepared cells of polycrystalline N-AlAs on p-GaAs on graphite, with the III-V semiconductor layers grown by chloride transport vapor phase deposition. From the photocurrent response versus wavelength we infer electron diffusion lengths of 1.8 and 1.0 µm in the polycrystal GaAs at hole concentrations p ∼ 4 and 8 × 1018cm-3respectively. This indicates peak internal quantum efficiency exceeding 90%. External power efficiencies are limited by the large spreading resistance in the top AlAs layer due to poor majority carrier transfer across grain boundaries.
Keywords
Boats; Gallium arsenide; Grain boundaries; Grain size; Inductors; Photovoltaic cells; Substrates; Temperature; Transistors; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1976 International
Type
conf
DOI
10.1109/IEDM.1976.189083
Filename
1478795
Link To Document