• DocumentCode
    3554359
  • Title

    The influence of surface states on open-circuit voltage for Cr, p-type silicon MIS solar cells

  • Author

    Anderson, W.A. ; Kim, J.K. ; Delahoy, A.E. ; Cartier, C.

  • Author_Institution
    Rutgers University, New Brunswick, New Jersey
  • Volume
    23
  • fYear
    1977
  • fDate
    1977
  • Firstpage
    55
  • Lastpage
    56
  • Abstract
    MIS diodes having 100-200 Å SiO2insulator thickness have been tested to determine conductance and capacitance variation with frequency and d.c. bias. Surface-state distribution in the energy gap has been calculated for commercial silicon wafers and Tyco silicon. A peak density of 6 × 1012-1 × 1013states/cm2-eV is located 0.4 to 0.7 eV above the valence band in most samples. Tyco silicon exhibits a higher total surface-state contribution than commercial silicon, which may account for the reduced open-circuit voltage. Thicker oxides appear to move the distribution closer to the valence band to influence the neutral level of surface states.
  • Keywords
    Capacitance; Chromium; Fabrication; Frequency; Insulation; Photovoltaic cells; Schottky diodes; Silicon; Surface treatment; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1977 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1977.189159
  • Filename
    1479239