DocumentCode
3554359
Title
The influence of surface states on open-circuit voltage for Cr, p-type silicon MIS solar cells
Author
Anderson, W.A. ; Kim, J.K. ; Delahoy, A.E. ; Cartier, C.
Author_Institution
Rutgers University, New Brunswick, New Jersey
Volume
23
fYear
1977
fDate
1977
Firstpage
55
Lastpage
56
Abstract
MIS diodes having 100-200 Å SiO2 insulator thickness have been tested to determine conductance and capacitance variation with frequency and d.c. bias. Surface-state distribution in the energy gap has been calculated for commercial silicon wafers and Tyco silicon. A peak density of 6 × 1012-1 × 1013states/cm2-eV is located 0.4 to 0.7 eV above the valence band in most samples. Tyco silicon exhibits a higher total surface-state contribution than commercial silicon, which may account for the reduced open-circuit voltage. Thicker oxides appear to move the distribution closer to the valence band to influence the neutral level of surface states.
Keywords
Capacitance; Chromium; Fabrication; Frequency; Insulation; Photovoltaic cells; Schottky diodes; Silicon; Surface treatment; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1977 International
Type
conf
DOI
10.1109/IEDM.1977.189159
Filename
1479239
Link To Document