• DocumentCode
    3554532
  • Title

    Ion implanted InSb photodetectors

  • Author

    Betz, H. ; Wiedeburg, K. ; Ryssel, H. ; Kranz, H.

  • Author_Institution
    Institut für Festkörpertechnologie, München, Germany
  • Volume
    23
  • fYear
    1977
  • fDate
    1977
  • Firstpage
    551
  • Lastpage
    554
  • Abstract
    Planar n+p- and p+n-photodetectors have been made in InSb by implantation of sulfur and beryllium, n+p-detectors show a flat response from 4.5 to 5.3 µm, resulting from the Burstein-Moss effect, whereas the p+n-detectors show the usual behavior of the response with a shift in the cutoff-wavelength from 4.8 to 5.5 µm depending on the substrate doping. The obtained peak detectivities are 3 × 1011cmHz1/2W-1for sulfur implanted and 1012cmHz1/2W-1for beryllium implanted diodes at a field of view of 0°. The corresponding externalquantum efficiencies are 40 to 60% for all detectors.
  • Keywords
    Annealing; Cadmium; Diodes; Doping; Etching; Implants; Infrared detectors; Photodetectors; Temperature; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1977 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1977.189317
  • Filename
    1479397