• DocumentCode
    3554827
  • Title

    Generalized guide for MOSFET miniaturization

  • Author

    Brews, J.R. ; Fichtner, W. ; Nicollian, E.H. ; Sze, S.M.

  • Author_Institution
    Bell Laboratories, Murray Hill, New Jersey
  • Volume
    25
  • fYear
    1979
  • fDate
    1979
  • Firstpage
    10
  • Lastpage
    13
  • Abstract
    As MOSFET dimensions are reduced, it is desirable to preserve long-channel MOSFET behavior. In general, lower voltages, shallower junctions, thinner oxides, and heavier doping help to maintain long-channel behavior as channel length is reduced. Our purpose here is to propose a simple, approximate relation between these parameters and the minimum channel length for which long-channel subthreshold behavior will be observed. This relation provides a simple estimate for MOSFET parameters, not requiring reduction of all dimensions by the same scale factor.
  • Keywords
    Computer errors; Doping; Equations; Geometry; MOSFET circuits; Oxidation; Parameter estimation; Semiconductor device modeling; Silicon; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1979 Internationa
  • Type

    conf

  • DOI
    10.1109/IEDM.1979.189526
  • Filename
    1480391