• DocumentCode
    3554928
  • Title

    BEST (Base Emitter Self-aligned Technology) a new fabrication method for bipolar LSI

  • Author

    Shimizu, M. ; Kitabayashi, H.

  • Author_Institution
    OKI Electric Industry Co, Ltd., Tokyo, Japan
  • Volume
    25
  • fYear
    1979
  • fDate
    1979
  • Firstpage
    332
  • Lastpage
    335
  • Abstract
    Base Emitter Self-aligned Technology (BEST) as developed as a practical method to increase the packing density of bipolar LSIs and to realize high speed when operated at low power. The BEST technology applies a selective oxidation technique on poly silicon. It produces a smaller device and reduces the circuit parasitic capacitance. An experimental low power CML 29-stage ring oscillator was made using BEST. Propagation delay time of 0.65 nanoseconds per gate was obtained at a power dissipation per gate of 0.6 milliwatts.
  • Keywords
    Circuits; Fabrication; Large scale integration; Oxidation; Parasitic capacitance; Propagation delay; Resistors; Ring oscillators; Silicon; Textile industry;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1979 Internationa
  • Type

    conf

  • DOI
    10.1109/IEDM.1979.189617
  • Filename
    1480482