• DocumentCode
    3554989
  • Title

    A new silicon heterojunction transistor using the doped SIPOS

  • Author

    Oh-uchi, N. ; Hayashi, H. ; Yamoto, H. ; Matsushita, T.

  • Author_Institution
    SONY Corporation, Atsugi, JAPAN
  • Volume
    25
  • fYear
    1979
  • fDate
    1979
  • Firstpage
    522
  • Lastpage
    525
  • Abstract
    A new silicon npn heterojunction transistor with the emitter Gummel number of 2 × 1015s/cm4has been realized using the P-doped SIPOS. The P-doped SIPOS used as an emitter has a wide energy band gap of 1.5 eV and the recombination velocity at SIPOS-Si interface is a very low value of the order of 102cm/s. Therefore, the current gain of the SIPOS-Si heterojunction transistor can be about 50 times as large as that of conventional silicon homojunction transistors with the same base Gummel number. A pnp heterojunction transistor has been also developed using the B-doped SIPOS and its current gain is about 5 times as large as that of conventional silicon pnp transistors.
  • Keywords
    Annealing; Chemicals; Heterojunctions; Hydrogen; Nitrogen; Photonic band gap; Radiative recombination; Semiconductor films; Silicon devices; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1979 Internationa
  • Type

    conf

  • DOI
    10.1109/IEDM.1979.189673
  • Filename
    1480538