DocumentCode
3555018
Title
GaAlAs/GaAs heterojunction Schottky barrier gate CCD
Author
Liu, Y.Z. ; Deyhimy, I. ; Anderson, R.J. ; Harris, J.S. ; Tomasetta, L.R.
Author_Institution
Rockwell International Electronics Research Center, Thousand Oaks, California
Volume
25
fYear
1979
fDate
1979
Firstpage
622
Lastpage
624
Abstract
A buried channel Schottky barrier gate GaAlAs/GaAs CCD is described. Device structures, fabrication techniques and results are discussed. Charge transfer efficiency of 0.9993 per transfer has been measured on these 30 gate (10 pixel) CCDs. Dark current was found to be about an order of magnitude lower in GaAlAs than in GaAs. The best Ga.78 Al.22 As device has between 2 to 4nA/cm2at room temperature.
Keywords
Charge coupled devices; Charge measurement; Charge transfer; Current measurement; Dark current; Fabrication; Gallium arsenide; Heterojunctions; Schottky barriers; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1979 Internationa
Type
conf
DOI
10.1109/IEDM.1979.189701
Filename
1480566
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