DocumentCode
3555170
Title
Capacitance measurement technique in high density MOS structures
Author
Iwai, Hiroshi ; Kohyama, Susumu
Author_Institution
Toshiba Corporation, Kawasaki, Japan
Volume
26
fYear
1980
fDate
1980
Firstpage
235
Lastpage
238
Abstract
A precise capacitance measurement technique is described. This technique is based on a principle of capacitively devided a.c. voltage measurement. In test devices, reference and test capacitors are connected in series, and intermidiate node signal is monitored by on chip linear sense amplifier. Utilizing the technique, various capacitances were measured, and quantitativery compared with a two dimensional numerical analysis. The results indicate that the technique is practical and accurate for evaluating capacitive elements in VLSI´s.
Keywords
Capacitance measurement; Circuit testing; Geometry; Laboratories; MOS capacitors; Parasitic capacitance; Pulse amplifiers; Semiconductor device measurement; Semiconductor devices; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1980 International
Type
conf
DOI
10.1109/IEDM.1980.189802
Filename
1481245
Link To Document