• DocumentCode
    3555170
  • Title

    Capacitance measurement technique in high density MOS structures

  • Author

    Iwai, Hiroshi ; Kohyama, Susumu

  • Author_Institution
    Toshiba Corporation, Kawasaki, Japan
  • Volume
    26
  • fYear
    1980
  • fDate
    1980
  • Firstpage
    235
  • Lastpage
    238
  • Abstract
    A precise capacitance measurement technique is described. This technique is based on a principle of capacitively devided a.c. voltage measurement. In test devices, reference and test capacitors are connected in series, and intermidiate node signal is monitored by on chip linear sense amplifier. Utilizing the technique, various capacitances were measured, and quantitativery compared with a two dimensional numerical analysis. The results indicate that the technique is practical and accurate for evaluating capacitive elements in VLSI´s.
  • Keywords
    Capacitance measurement; Circuit testing; Geometry; Laboratories; MOS capacitors; Parasitic capacitance; Pulse amplifiers; Semiconductor device measurement; Semiconductor devices; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1980 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1980.189802
  • Filename
    1481245