DocumentCode
3555359
Title
The influence of bandgap narrowing and impurity deionization on the characteristics of silicon bipolar microwave transistors
Author
Mao, Jun-ye
Author_Institution
Chengdu Institute of Radio Engineering, Szechuan, People´´s Republic of China
Volume
26
fYear
1980
fDate
1980
Firstpage
838
Lastpage
840
Abstract
The emitter regions of Silicon bipolar microwave transistors are usually heavily doped. The magnitude and distribution of impurity concentrations of the emitter and base regions depend upon the designs and technologies of the transistors. Both the bandgap narrowing and the impurity deionization have influence on majority carrier concentrations, minority carrier concentrations and the characteristics of transistors. Considering only one of them may lead to somewhat unsatisfactory results. In this paper an analytical treatment of ideal emitter injection-efficiency-limited current gain of a bipolar device is presented that includes the effects of bandgap narrowing, impurity deionization and Fermi-Dirac statistics. The results predicted by the present analysis are compared with those from other sources, and we can hereby draw some useful conclusions.
Keywords
Current density; Doping; Impurities; Microwave transistors; Ohmic contacts; Photonic band gap; Quasi-doping; Silicon; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1980 International
Type
conf
DOI
10.1109/IEDM.1980.189972
Filename
1481415
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