• DocumentCode
    3556241
  • Title

    A new soft error mechanism of dynamic memory with grounded cell plate

  • Author

    Ishiuchi, H. ; Okada, Y. ; Ekiguchi, N. ; Tanaka, T. ; Ozawa, O.

  • Author_Institution
    Toshiba Corporation, Kawasaki, Japan
  • Volume
    30
  • fYear
    1984
  • fDate
    1984
  • Firstpage
    252
  • Lastpage
    255
  • Abstract
    This paper reports a new soft error mechanism of dynamic random access memory (DRAM) with grounded cell plate. We find that the existence of p-type inversion layer at the oxide-substrate. interface in the DRAM cell capacitor causes drastic increase of the soft error rate (SER), We. propose a quantitative model to analyze the mechanism of the new soft error mode. The effectiveness of the model is demonstrated using an n-channel 256k DRAM with the grounded cell plate. The optimization scheme of the cell capacitor for the future DRAM´s is also described based on the model. The soft error mode leads to much severer lower bound of the n-concentration of the cell capacitor than that given in the previous works.
  • Keywords
    Alpha particles; Capacitance; DRAM chips; Error analysis; Laboratories; MOS capacitors; Random access memory; Semiconductor devices; Semiconductor impurities; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1984 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1984.190694
  • Filename
    1484465