• DocumentCode
    3556560
  • Title

    High conversion efficiency and radiation resistant InP solar cell

  • Author

    Itoh, Y. ; Ando, K. ; Yamaguchi, M. ; Uemura, C.

  • Author_Institution
    NTT, Ibraki, Japan
  • Volume
    31
  • fYear
    1985
  • fDate
    1985
  • Firstpage
    475
  • Lastpage
    478
  • Abstract
    This paper presents an investigation of the p+-i-n junction structure InP solar cells fabricated on n-type InP substrates by a liquid phase epitaxial (LPE) growth method using Mg as a p-type dopant. It was found that the junction depth and structure could be controlled by use of Mg diffusion properties during LPE growth. The conversion efficiencies of p+-i-n structure cells are as high as 21.5% at AM 1.5 and 17.2% at AM 0, which are the highest ever reported. The radiation resistance of the p+-i-n structure cell was not as good as the n+-p structure cell because of an increase in the leakage current due to the recombination center introduced in the i-layer with irradiation. Its radiation resistance has been found to be improved by optimizing i-layer thickness for the p+-i-n structure cell.
  • Keywords
    Annealing; Indium phosphide; Laboratories; Leakage current; Photovoltaic cells; Resistance; Substrates; Surface morphology; Temperature dependence; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1985 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1985.191006
  • Filename
    1485556