DocumentCode
3556560
Title
High conversion efficiency and radiation resistant InP solar cell
Author
Itoh, Y. ; Ando, K. ; Yamaguchi, M. ; Uemura, C.
Author_Institution
NTT, Ibraki, Japan
Volume
31
fYear
1985
fDate
1985
Firstpage
475
Lastpage
478
Abstract
This paper presents an investigation of the p+-i-n junction structure InP solar cells fabricated on n-type InP substrates by a liquid phase epitaxial (LPE) growth method using Mg as a p-type dopant. It was found that the junction depth and structure could be controlled by use of Mg diffusion properties during LPE growth. The conversion efficiencies of p+-i-n structure cells are as high as 21.5% at AM 1.5 and 17.2% at AM 0, which are the highest ever reported. The radiation resistance of the p+-i-n structure cell was not as good as the n+-p structure cell because of an increase in the leakage current due to the recombination center introduced in the i-layer with irradiation. Its radiation resistance has been found to be improved by optimizing i-layer thickness for the p+-i-n structure cell.
Keywords
Annealing; Indium phosphide; Laboratories; Leakage current; Photovoltaic cells; Resistance; Substrates; Surface morphology; Temperature dependence; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1985 International
Type
conf
DOI
10.1109/IEDM.1985.191006
Filename
1485556
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