• DocumentCode
    3556742
  • Title

    The effects of weak gate-to-drain(source) overlap on MOSFET characteristics

  • Author

    Ko, P.K. ; Chan, T.Y. ; Wu, A.T. ; Hu, C.

  • Author_Institution
    University of California, Berkeley, CA
  • Volume
    32
  • fYear
    1986
  • fDate
    1986
  • Firstpage
    292
  • Lastpage
    295
  • Abstract
    Recent studies showed that minor structural differences in the gate-to-drain (source) overlap of a MOSFET has unexpectedly strong influence on its characteristics. As the overlap is weakened, the drain drive degrades, the substrate and gate currents show abnormal behaviors, and the device lifetime suffers. A simple physical model is presented that adequately explains most of these observed high-field effects, including the asymmetry in device properties. Implications of the wear-overlap phenomena on future process and device designs are discussed.
  • Keywords
    Degradation; EPROM; Ice; Implants; Intrusion detection; Ion implantation; MOSFET circuits; Process control; Process design; Space technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1986 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1986.191173
  • Filename
    1486431