• DocumentCode
    3556903
  • Title

    New SOI CMOS process with selective oxidation

  • Author

    Kubota, M. ; Tamaki, T. ; Kawakita, K. ; Nomura, N. ; Takemoto, T.

  • Author_Institution
    Matsushita Electric Industrial Co., Ltd. , Osaka, Japan
  • Volume
    32
  • fYear
    1986
  • fDate
    1986
  • Firstpage
    814
  • Lastpage
    816
  • Keywords
    Anisotropic magnetoresistance; CMOS process; CMOS technology; Electrical equipment industry; Etching; Fabrication; MOSFETs; Oxidation; Silicon on insulator technology; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1986 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1986.191322
  • Filename
    1486580
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3556903