DocumentCode
3557046
Title
Process diagnostic and fluctuation analysis using a two-dimensional simulation system with a new linearized iteration method
Author
Onga, Shinji ; Wada, Tetsunori
Author_Institution
Toshiba Corporation, Kawasaki, Japan
Volume
33
fYear
1987
fDate
1987
Firstpage
268
Lastpage
271
Abstract
In this paper, we present, (i) a general concept of the simulation system, (ii) algorithm of process fluctuation analysis, and (iii) inference engine of AI software package and demonstrate typical evidences of execution results, and also discuss a capability of "reverse-way" simulation system which could optimize process starting from definite requirements of device characteristics.
Keywords
Analytical models; Artificial intelligence; CMOS process; Engines; Fluctuations; Frequency; Impurities; Lithography; Sensitivity analysis; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1987 International
Type
conf
DOI
10.1109/IEDM.1987.191406
Filename
1487364
Link To Document