DocumentCode :
3557191
Title :
LDMOS and LIGT´s in CMOS technology for power integrated circuits
Author :
Mukherjee, Satyen ; Amato, Mike ; Wacyk, I. ; Rumennik, Viadimir
Author_Institution :
North American Philips Corporation, Briarcliff Manor, NY, USA
Volume :
33
fYear :
1987
fDate :
1987
Firstpage :
778
Lastpage :
781
Abstract :
In MOS Power Integrated Circuits, the Lateral Double Diffused MOS Transistor (LDMOS) has been used as a power device because of its ease of integration with CMOS circuitry. In this paper, two versions of a Switched Mode Power Supply chip are described using Lateral Insulated Gate Transistor (LIGT) in one and LDMOS in the other. The LIGT version results in substantial reduction of die size for the same functionality because of the reduced specific on-resistance of the LIGT in comparison with LDMOS. An-type epitaxial layer process and RESURF concept has been used to implement the two high voltage designs with CMOS control circuitry.
Keywords :
Anodes; CMOS process; CMOS technology; Conductivity; Epitaxial layers; Insulation; Integrated circuit technology; MOSFETs; Power integrated circuits; Switched-mode power supply;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1987 International
Type :
conf
DOI :
10.1109/IEDM.1987.191547
Filename :
1487505
Link To Document :
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