Title :
0.5 Micron BICMOS technology
Author :
Momose, H. ; Cham, K.M. ; Drowley, C.I. ; Grinolds, H.R. ; Fu, H.S.
Author_Institution :
Toshiba Corp., Kawasaki, Japan
Keywords :
BiCMOS integrated circuits; CMOS technology; Capacitance; Cutoff frequency; Delay effects; Propagation delay; Research and development; Ring oscillators; Very large scale integration; Voltage;
Conference_Titel :
Electron Devices Meeting, 1987 International
DOI :
10.1109/IEDM.1987.191563
