• DocumentCode
    355797
  • Title

    I-V characteristics of metal-organic film-silicon structure

  • Author

    Spoutai, Serguei ; Chun, Hui-Gon

  • Author_Institution
    Dept. of Appl. & Theor. Phys., Novosibirsk State Tech. Univ., Russia
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    224
  • Abstract
    Electrical characteristics of the Metal-Organic Film-Semiconductor structures have been investigated. As the top metal electrode Ag was used. As the organic film PTCDA (perylenetetracarboxylic dianhydride) was chosen. The semiconductor was p-type Si. The current-voltage (I-V) and capacitance-voltage (C-V) characteristics in a wide temperature range from 150 K to 300 K were measured. The frequency dependence of the capacitance and transient capacitance measurements-were performed as well. The results show that I-V characteristics are non-linear with the “power” law current dependence under the forward bias and saturation-like behaviour under reverse bias. The activation energy of the reverse current is close to the activation energy of traps
  • Keywords
    MIS structures; organic compounds; 150 to 300 K; Ag-PTCDA-Si MIS structure; activation energy; capacitance-voltage characteristics; current-voltage characteristics; electrical characteristics; metal-organic film-silicon structure; perylenetetracarboxylic dianhydride; Capacitance measurement; Capacitance-voltage characteristics; Current measurement; Electric variables; Electrodes; Frequency dependence; Frequency measurement; Performance evaluation; Semiconductor films; Temperature distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Science and Technology, 2000. KORUS 2000. Proceedings. The 4th Korea-Russia International Symposium on
  • Conference_Location
    Ulsan
  • Print_ISBN
    0-7803-6486-4
  • Type

    conf

  • DOI
    10.1109/KORUS.2000.866030
  • Filename
    866030