DocumentCode :
3558144
Title :
Conduction in sputtered a-Si-H Schottky-barrier solar cells
Author :
Thompson, M.J. ; Alkaisi, M.M. ; Allison, J.
Author_Institution :
University of Sheffield, Department of Electronic & Electrical Engineering, Sheffield, UK
Volume :
127
Issue :
4
fYear :
1980
fDate :
8/1/1980 12:00:00 AM
Firstpage :
212
Lastpage :
217
Abstract :
This paper describes the conduction mechanisms in r.f.-sputtered Schottky-barrier solar cells incorporating hydrogenated amorphous Si (a-Si-H). The illumination and temperature dependence of the open-circuit voltage(VOC) and the short-circuit current (Js¿c) of the cells are discussed. The properties of the cells containing optimum and nonoptimum a-Si-H and various Schottky metals are contrasted. The temperature dependence of the forward characteristics of the cells is also examined. Three different conduction mechanisms in the Schottky-barrier cells are identified and described.
Keywords :
Schottky effect; amorphous semiconductors; elemental semiconductors; hydrogen; radiofrequency sputtering; silicon; solar cells; RF sputtering; amorphous Si:H Schottky barrier solar cells; conductance mechanism; illumination; open circuit voltage; short circuit current;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
Conference_Location :
8/1/1980 12:00:00 AM
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1980.0043
Filename :
4642510
Link To Document :
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