DocumentCode :
355937
Title :
The emerging revolution in nanotechnology
Author :
Trew, R.J.
Author_Institution :
US Dept. of Defense, Arlington, VA, USA
Volume :
1
fYear :
1999
fDate :
1999
Firstpage :
6
Abstract :
The world is experiencing rapid progress in the ability to design and fabricate mechanical and devices and structures with nanoscale dimensions. This ability stems from parallel advances in materials growth patterning techniques, imaging and manipulation and advances in characterization and testing. When taken together, these techniques form the basis for designing and fabricating devices and structures using atomic level control. Nanotechnology will form the basis for new devices and structures with performance far exceeding that available from current systems.
Keywords :
nanotechnology; nanotechnology; Atomic layer deposition; Chemical technology; Lithography; Materials science and technology; Materials testing; Molecular beam epitaxial growth; Nanobioscience; Nanostructures; Nanotechnology; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Optoelectronics Conference, 1999. SBMO/IEEE MTT-S, APS and LEOS - IMOC '99. International
Print_ISBN :
0-7803-5807-4
Type :
conf
DOI :
10.1109/IMOC.1999.867026
Filename :
867026
Link To Document :
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