Plasma properties of YBaCuO oxide films by rf facing targets magnetron sputtering

Author

Choi, Chung-Seog ; Ebihara, Kenji ; Park, Bok-Kee ; Seong, Nak- Jin ; Kyung-Sup Lee ; Lee, Duck-Chool

Author_Institution

Inha Univ., Inchon, South Korea

Volume

1

fYear

1997

Firstpage

589

Abstract

The optical emission of the rf facing targets magnetron sputtering (rf FTMS) plasma was analyzed to elucidate the sputtering process and the gas phase reaction. It is shown that oxygen content affects the amount of sputtered species. The resulting optimum conditions were found to be an rf power of 50 W, substrate position of 20 mm, total gas pressure of 60 mTorr, oxygen mixture ratio of 40%, and substrate temperature of 650°C

Keywords

atomic emission spectroscopy; barium compounds; high-temperature superconductors; plasma diagnostics; sputter deposition; superconducting thin films; yttrium compounds; 20 mm; 50 W; 60 mtorr; 650 C; O content; O₂ mixture ratio; O₂-Ar; YBaCuO; YBaCuO films; gas phase reaction; optical emission; optimum conditions; plasma properties; rf facing targets magnetron sputtering; rf power; sputtering process; substrate position; substrate temperature; total gas pressure; Plasma measurements; Plasma properties; Plasma temperature; Radio frequency; Sputtering; Stimulated emission; Substrates; Superconducting magnets; Temperature measurement; Yttrium barium copper oxide;

fLanguage

English

Publisher

ieee

Conference_Titel

Properties and Applications of Dielectric Materials, 1997., Proceedings of the 5th International Conference on

Print_ISBN

0-7803-2651-2

Type

conf

DOI

10.1109/ICPADM.1997.617669

Filename

617669