Title :
Model-based control of rapid thermal processes
Author :
Stuber, J.D. ; Trachtenberg, I. ; Edgar, Thomas F.
Author_Institution :
Dept. of Chem. Eng., Texas Univ., Austin, TX
Abstract :
Model-based control for two rapid thermal processing systems has been performed. The condition number of the process influences the control strategies selected and the quality of control that can be achieved. For the Texas Instruments RTP system, a successively linearized quadratic dynamic matrix control (QDMC) strategy using a reduced set of outputs has been developed. Experimental results of the control strategy are presented and compared with internal model control with gain scheduling. The nonlinear controller discussed shows superior performance for the test case studied. The second RTP system designed by SEMATECH exhibits improved controllability. This system has the potential for tighter control of wafer temperature using gain scheduling
Keywords :
controllability; multivariable control systems; nonlinear control systems; process control; rapid thermal processing; semiconductor device manufacture; temperature control; SEMATECH; Texas Instruments RTP system; controllability; gain scheduling; model-based control; nonlinear controller; quadratic dynamic matrix control; rapid thermal processes; wafer temperature control; Control systems; Infrared heating; Instruments; Nonlinear dynamical systems; Predictive models; Rapid thermal processing; Semiconductor device modeling; Temperature control; Temperature sensors; Testing;
Conference_Titel :
Decision and Control, 1994., Proceedings of the 33rd IEEE Conference on
Print_ISBN :
0-7803-1968-0
DOI :
10.1109/CDC.1994.411042
