• DocumentCode
    3570294
  • Title

    Residual stress analysis of HfO2/SiO2 multilayer coatings using finite element method

  • Author

    Chunxue Gao ; Zhiwei Zhao

  • Author_Institution
    Sch. of Electron. Sci. & Eng., Southeast Univ., Nanjing, China
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    HfO2/SiO2 multilayer coatings are usually applied to precise optical instruments and large optical systems. An equivalent reference temperature (ERT) technique had been proposed and used to model and evaluate the intrinsic strains of layered structures. This study has used finite element method and the equivalent reference temperature (ERT) technique to simulate the residual stress in HfO2/SiO2 multilayer coatings.
  • Keywords
    Poisson ratio; coatings; finite element analysis; hafnium compounds; internal stresses; multilayers; silicon compounds; stress analysis; thermal expansion; HfO2-SiO2; Poisson ratio; elastic modulus; equivalent reference temperature; finite element method; intrinsic strains; multilayer coatings; optical instruments; optical systems; residual stress analysis; thermal expansion coefficient; Coatings; Finite element analysis; Hafnium compounds; Nonhomogeneous media; Residual stresses; Substrates; HfO2/SiO2; finite element method; residual stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference (IVEC), 2015 IEEE International
  • Print_ISBN
    978-1-4799-7109-1
  • Type

    conf

  • DOI
    10.1109/IVEC.2015.7223996
  • Filename
    7223996
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3570294