Title :
Scalable Logic Gate Non-Volatile Memory
Author :
Lee Wang ; Shi-Ming Hsu
Author_Institution :
FlashSilicon Inc., Zhubei, Taiwan
Abstract :
Scalable Logic Gate Non-Volatile Memory (SLGNVM) devices fabricated with standard CMOS logic process have been demonstrated with 110 nm, 55 nm, and 40 nm nodes. The cell sizes for the NOR flash array complied with the process design rules of the CMOS logic nodes are 0.5424 μm2, 0.2287 μm2, and 0.1095 μm2, respectively. The SLGNVM devices have 3V ~ 5V program/erase windows with good data retention and endurance properties. The arrays of SLGNVM devices are suitable for embedded EEPROM and flash in digital circuitries, and for the new applications of non-volatile-SRAM (nvSRAM), Non-Volatile-Register (NVR), and non-volatile FPGA (nvFPGA).
Keywords :
CMOS memory circuits; logic gates; random-access storage; CMOS logic process; NOR flash array; embedded EEPROM; nonvolatile FPGA; nonvolatile SRAM; nonvolatile register; scalable logic gate nonvolatile memory; size 110 nm; size 40 nm; size 55 nm; Arrays; CMOS integrated circuits; Logic gates; Nonvolatile memory; Programming; Registers; Threshold voltage; CMOS; Logic; Non-Volatile Memory; Scalable;
Conference_Titel :
Non-Volatile Memory Technology Symposium (NVMTS), 2014 14th Annual
Print_ISBN :
978-1-4799-4203-9
DOI :
10.1109/NVMTS.2014.7060846