Author :
Tanizawa, Ken ; Suzuki, Keijiro ; Toyama, Munehiro ; Ohtsuka, Minoru ; Yokoyama, Nobuyuki ; Matsumaro, Kazuyuki ; Seki, Miyoshi ; Koshino, Keiji ; Sugaya, Toshio ; Suda, Satoshi ; Cong, Guangwei ; Kimura, Toshio ; Ikeda, Kazuhiro ; Namiki, Shu ; Kawashima
Keywords :
elemental semiconductors; integrated optics; integrated optoelectronics; lithography; optical communication equipment; optical crosstalk; optical losses; optical switches; silicon; silicon-on-insulator; thermo-optical devices; ArF immersion lithography; Mach-Zehnder switch; SOI platform; crosstalk; loss 19.7 dB; on-chip loss; silicon-on-insulator; strictly nonblocking Si-wire optical switch; thermooptic MZ switches; ultracompact path-independent insertion-loss optical switch; ultrasmall die; Crosstalk; Flip-chip devices; Optical crosstalk; Optical device fabrication; Optical switches; Optical waveguides; System-on-chip;