• DocumentCode
    3596906
  • Title

    GaAs/Si tandem solar cell using epitaxial lift-off technique

  • Author

    Taguchi, Hironori ; Okada, Naoaki ; Soga, Tetsuo ; Jimbo, Takashi ; Umeno, Masayoshi

  • Author_Institution
    Lecip Corp., Gifu-ken, Japan
  • Volume
    1
  • fYear
    2003
  • Firstpage
    769
  • Abstract
    The transplantation of GaAs solar cell from GaAs substrate to Si substrate without degrading the conversion efficiency is possible. The crystal quality of the transplanted GaAs film on Si substrate is comparable to that grown on GaAs substrate and much higher than that grown on Si substrate by heteroepitaxy. The conversion efficiencies of GaAs solar cell bonded to Si substrate and homoepitaxial GaAs solar cell without antireflection coating are 13.7% and 14.1% (AM0, 1 sun), respectively. The GaAs/Si tandem solar cell with the efficiency of 19.4% (top cell: 18.2%, bottom cell: 1.2%) has been demonstrated.
  • Keywords
    III-V semiconductors; elemental semiconductors; gallium arsenide; semiconductor epitaxial layers; silicon; solar cells; 13.7 percent; 14.1 percent; 19.4 percent; GaAs; GaAs-Si; Si; conversion efficiency; crystal quality; epitaxial lift-off technique; heteroepitaxy; tandem solar cell; transplantation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1305396