Title :
A New Anisotropic Etching of N+ Poly-Si Using XeCl Excimer Laser Beam
Author :
Okano, H. ; Sekine, M. ; Horiike, Y.
Author_Institution :
Toshiba VLSI Research Center, Toshiba Corp. 1, Toshiba-cho, Saiwaiku, Kawasaki, Japan 210
Keywords :
Anisotropic magnetoresistance; Etching; Gas lasers; Laser beams; Lithography; Mercury (metals); Protection; Surface emitting lasers; Surface waves; Very large scale integration;
Conference_Titel :
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Print_ISBN :
4-930813-08-5
